DocumentCode
578041
Title
Si photonic device uniformity improvement using wafer-scale location specific processing
Author
Selvaraja, Shankar ; Fernandez, Luis ; Vanslembrouck, Michael ; Everaert, Jean-Luc ; Dumon, Pieter ; Van Campenhout, Joris ; Bogaerts, Wim ; Absil, Philippe
Author_Institution
Photonics Res. Group, Ghent Univ., Ghent, Belgium
fYear
2012
fDate
23-27 Sept. 2012
Firstpage
725
Lastpage
726
Abstract
We report two-fold improvement in Si photonic device uniformity over a 200mm SOI wafer through location specific processing. A within wafer thickness non-uniformity of 0.8nm yielding a grating fiber-coupler peak-wavelength non-uniformity of 1.8nm is achieved.
Keywords
diffraction gratings; integrated optics; optical fabrication; optical fibre couplers; optical fibre fabrication; silicon-on-insulator; SOI wafer; Si; grating fiber coupler; photonic device uniformity; size 200 mm; wafer scale location specific processing; Couplers; Gratings; Optical buffering; Optical surface waves; Photonics; Silicon; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2012 IEEE
Conference_Location
Burlingame, CA
Print_ISBN
978-1-4577-0731-5
Type
conf
DOI
10.1109/IPCon.2012.6358827
Filename
6358827
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