Electroless nickel plating on fluoroplastics films using atmospheric pressure nonthermal plasma graft polymerization process

Electroless nickel plating and photolithography on a fluoroplastics film, which is treated by atmospheric pressure nonthermal plasma graft polymerization, is investigated. Fluoroplastics such as PFA (perfluoroalkoxy fluoroplastics) and PTFE (polytetrafluoroethylene) are extremely stable, inactive, and hydrophobic. Therefore, it is difficult to apply them to electric circuits without surface treatment. In this study, a low-environmental load surface modification of a PTFE film using an atmospheric nonthermal plasma graft polymerization device that can treat A4-size sample is performed. In addition, electroless nickel plating and photolithography on the treated PTFE film are achieved successfully.