Title :
On the throughput of deterministic flow lines with random state dependent setups: Stochastic models and applications
Author :
Kim, Woo-sung ; Morrison, James R.
Author_Institution :
Dept. of Ind. & Syst. Eng., KAIST, Daejeon, South Korea
Abstract :
Inspired by clustered photolithography tools in semiconductor wafer manufacturing, we study flow lines with deterministic process times subject to random state dependent setups. For tractability, we assume that the setup probability is constant and independent from customer to customer; the setup duration is constant. We show that the internal state of such a flow line can be modeled as a Markov chain when customers arrive in a just-in-time (JIT) fashion. We then develop expressions for the system throughput. We apply our models to clustered photolithography tools and demonstrate how the methods can be used to calculate their capacity.
Keywords :
Markov processes; just-in-time; photolithography; semiconductor technology; JIT; Markov chain; clustered photolithography tools; deterministic flow line; deterministic process times; just-in-time; semiconductor wafer manufacturing; setup probability; stochastic model; tractability; Delay; Equations; Indexes; Markov processes; Semiconductor device modeling; Servers; Throughput;
Conference_Titel :
Automation Science and Engineering (CASE), 2012 IEEE International Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-0429-0
DOI :
10.1109/CoASE.2012.6386441