DocumentCode :
584914
Title :
Prepulse influence on the electron beam pinch behavior in a large aspect ratio diode
Author :
Cabe, J. ; Delvaux, J. ; Jouys, J.C. ; Peugnet, C. ; Buzzi, J.M. ; Doucet, H.J. ; Lamain, H. ; Rouille, C.
Author_Institution :
Centre d´´Etudes de Valduc, Commissariat a l´´Energie Atomique, Is-sur-Tille, France
Volume :
1
fYear :
1977
fDate :
3-5 Oct. 1977
Firstpage :
23
Lastpage :
35
Abstract :
It is well known that in REB Generators the prepulse causes great inconvenience and it is necessary to control its effects. In this paper we show the large aspect ratio diode behavior of a low impedance REB Generator (CHANTECLAIR, 2 ohms - 500 kV - 60 ns) with and without prepulse. With or without prepulse, the first noticeable fact to take into account consists of the basic mechanism which tends to pinch the beam. Wi th a 20 kV - 700 ns prepulse, the anode cathode gap is filled with a low density plasma which avoids the self focalisation observed without prepulse . It is possible to reach a narrow pinch on the anode by using some technological arrangements in this last case; the energy in the pinch is less than without prepulse.
Keywords :
pinch effect; plasma diodes; relativistic electron beams; REB generators; electron beam pinch; large aspect ratio diode; relativistic electron beam generator; self-focalisation; voltage 20 kV; voltage 500 kV; Abstracts; Anodes; Atomic layer deposition; Generators; Lead; Magnetic field measurement; Plasma measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Beam Research & Technology, 1977 2nd International Topical Conference on
Conference_Location :
Ithaca, NY
Type :
conf
Filename :
6396175
Link To Document :
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