DocumentCode
585026
Title
Plasma filled diode operation with plasma created in situ by a low pressure hollow gas discharge
Author
Blaugrund, A.E. ; Cooperstein, G. ; Oliphant, W.F. ; Stephanakis, S.J. ; Weber, B.V.
Author_Institution
Weizmann Inst. of Sci., Rehovot, Israel
fYear
1990
fDate
2-5 July 1990
Firstpage
463
Lastpage
468
Abstract
Plasma filled diode experiments have been performed at .1 to .5 TW by producing a hollow, Penning like, discharge in low pressure gas inside the A-K gap of an electron beam diode. A low impedance phase was observed whose duration could be controlled by the gas pressure and the initial plasma current. At the end of this low impedance phase, the diode voltage and impedance rise abruptly with observed switching times less than 10 ns.
Keywords
Penning discharges; electron beams; plasma diodes; plasma pressure; plasma production; plasma transport processes; Penning type discharge; gas pressure; hollow gas discharge; impedance phase; plasma creation; plasma current; plasma filled diode operation; power 0.1 TW to 0.5 TW; Anodes; Discharges (electric); Electron beams; Impedance; Plasma density; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
High-Power Particle Beams, 1990 8th International Conference on
Conference_Location
Novosibirsk
Print_ISBN
9.7898102055e+012
Type
conf
Filename
6396309
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