DocumentCode :
585026
Title :
Plasma filled diode operation with plasma created in situ by a low pressure hollow gas discharge
Author :
Blaugrund, A.E. ; Cooperstein, G. ; Oliphant, W.F. ; Stephanakis, S.J. ; Weber, B.V.
Author_Institution :
Weizmann Inst. of Sci., Rehovot, Israel
fYear :
1990
fDate :
2-5 July 1990
Firstpage :
463
Lastpage :
468
Abstract :
Plasma filled diode experiments have been performed at .1 to .5 TW by producing a hollow, Penning like, discharge in low pressure gas inside the A-K gap of an electron beam diode. A low impedance phase was observed whose duration could be controlled by the gas pressure and the initial plasma current. At the end of this low impedance phase, the diode voltage and impedance rise abruptly with observed switching times less than 10 ns.
Keywords :
Penning discharges; electron beams; plasma diodes; plasma pressure; plasma production; plasma transport processes; Penning type discharge; gas pressure; hollow gas discharge; impedance phase; plasma creation; plasma current; plasma filled diode operation; power 0.1 TW to 0.5 TW; Anodes; Discharges (electric); Electron beams; Impedance; Plasma density; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High-Power Particle Beams, 1990 8th International Conference on
Conference_Location :
Novosibirsk
Print_ISBN :
9.7898102055e+012
Type :
conf
Filename :
6396309
Link To Document :
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