Title :
Focusing of intense ion beam by the “Inverse Pinch Ion Diode”
Author :
Hashimoto, Y. ; Sato, M. ; Yatsuzuka, M. ; Nobuhara, S.
Author_Institution :
Dept. of Electr. Eng., Himeji Inst. of Technol., Himeji, Japan
Abstract :
Focusing of intense ion beams has been attained with the “Inverse Pinch Ion Diode” which has a flat anode. The energy of the ion beam was 180 keV. At the focal point, the ion current density of 0.5 kA/cm2 has been obtained and the focusing radius of the ion beam (FWHM) is 10 mm. Focusing of the ion beam is due to the electrostatic field in the “Inverse Pinch Ion Diode”.
Keywords :
anodes; current density; electric fields; plasma confinement; plasma diodes; plasma focus; FWHM; electron volt energy 180 keV; electrostatic field; flat anode; focusing radius; intense ion beam focusing; inverse pinch ion diode; ion current density; size 10 mm; Anodes; Cathodes; Current density; Focusing; Ion beams; Voltage measurement;
Conference_Titel :
High-Power Particle Beams, 1990 8th International Conference on
Conference_Location :
Novosibirsk
Print_ISBN :
9.7898102055e+012
