Title :
REB focusing in high aspect ratio diodes
Author :
Spence, P. ; Triebes, K. ; Genuario, R. ; Pellinen, D.
Author_Institution :
Phys. Int. Co., San Leandro, CA, USA
Abstract :
Typical current-voltage “trajectories” in pinched electron beam diodes have been characterized by a sequence of phases beginning with cathode plasma formation and expansion, a Langmuir-Childs phase, transition to and operation in a focussed beam made (where the cathode plasma is contained in the Bθ fields and forced back toward the cathode), and a final impedance collapse phase [1]. Recent experiments with tapered hollow cathodes have addressed the transition phase and indicate that formation of an anode plasma is required (in addition to the current exceeding the Friedlander and Jory critical current, Ic) before the impedance deviates from a Langmuir-Childs trajectory. Time correlated measurements of beam pinch collapse initiation, proton beam generation, and pinch arrival on axis are given. Once the pinch is formed the impedance is found to be within ±15 percent of the saturated parapotential value for the remainder of the driving pulse. Comparison with previous data indicates that a 300 to 450 J/gm dose is required to form the anode plasma (brass and copper anodes) and suggests that ≈ simultaneous achievement of I ≈ Ic and anode plasma formation produces a longer-lived, more stable pinched flow phase.
Keywords :
anodes; cathodes; pinch effect; plasma diodes; plasma focus; Friedlander critical current; Jory critical current; Langmuir-Childs phase; Langmuir-Childs trajectory; REB focusing; anode plasma formation; beam pinch collapse initiation; cathode plasma expansion; cathode plasma formation; current-voltage trajectories; final impedance collapse phase; high aspect ratio diodes; pinch arrival; pinched electron beam diodes; pinched flow phase; proton beam generation; tapered hollow cathodes; time correlated measurements; transition phase; Anodes; Cathodes; Impedance; Magnetic separation; Particle beams; Plasmas; Saturation magnetization;
Conference_Titel :
Electron Beam Research & Technology, 1975 International Topical Conference on
Conference_Location :
Albuquerque, NM
Print_ISBN :
0-8493-6926-6