• DocumentCode
    585585
  • Title

    Intense, pulsed, ion-diode sources and their application to mirror machines

  • Author

    Prono, D.S. ; Shearer, J.W. ; Briggs, R.J.

  • Author_Institution
    Lawrence Livermore Lab., Univ. of California, Livermore, Livermore, CA, USA
  • Volume
    1
  • fYear
    1975
  • fDate
    3-5 Nov. 1975
  • Firstpage
    575
  • Lastpage
    589
  • Abstract
    Startup conditions for future mirror fusion experiments require a rapidly formed target plasma of ~0.5 coulomb of ions with energy of 50 to 100 keV. Theory suggests that very intense ion-flux emission satisfying these requirements can be extracted from a pulsed ion diode. Developing such sources would be an ideal CTR application of the high-power, single-shot capability of pulsed power technology. Recent experimental results are reviewed in which ~2 kA/cm2 of D+ at ~50 keV was extracted. In the experiment, an intense relativistic electron beam undergoes many transits through a solid but range-thin anode foil. With each transit the electrons lose energy, causing their trajectories to collapse toward the anode surface. In so doing, the increased space charge extracts an intense ion flux from the anode foil IS plasma. Observations are reported on the importance of diode stability. The general agreement between theoretical scaling laws and experimental results is also presented.
  • Keywords
    diodes; ion sources; relativistic electron beams; CTR application; anode foil IS plasma; electron volt energy 50 keV to 100 keV; intense ion flux; intense ion-diode sources; ion-flux emission; mirror fusion; mirror machines; pulsed ion diode; pulsed ion-diode sources; range thin anode foil; space charge; target plasma;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Beam Research & Technology, 1975 International Topical Conference on
  • Conference_Location
    Albuquerque, NM
  • Print_ISBN
    0-8493-6926-6
  • Type

    conf

  • Filename
    6397707