Title :
Twin-scale vernier micro-pattern for visual measurement of 1D in-plane absolute displacements with increased range-to-resolution ratio
Author :
Zea, J.G. ; Sandoz, Patrick ; Laurent, Guillaume ; Lemos, L.L. ; Clevy, Cedric
Author_Institution :
AS2M Dept, Univ. de Franche-Comte, Besancon, France
Abstract :
This paper presents a visual method for 1D in-plane displacement measurement which combines a resolution of a few nanometers with an unambiguous excursion range of 168μm. Furthermore, position retrieval is only based on elementary phase computations and thus might become compatible with high-rate processing by implementing the processing algorithm on high speed computing architectures like a DSP or a FPGA device. The method is based on a twin scale Vernier micro-pattern fixed on the moving target of interest. The two periodic grids have slightly different periods in order to encode the period order within the phase difference observed between the two sub-patterns. As a result, an unambiguous range of 168μm is obtained from grid periods of 8μm and 8.4μm. The resolution is evaluated to be of 11.7nm despite remaining mechanical disturbances. Differential measurements demonstrated indeed a measurement accuracy better than 5nm.
Keywords :
digital signal processing chips; displacement measurement; field programmable gate arrays; nanotechnology; 1D in-plane absolute displacements; DSP; FPGA device; differential measurements; elementary phase computations; high speed computing architectures; position retrieval; size 11.7 nm; size 8 mum; size 8.4 mum; twin scale Vernier micro-pattern; twin-scale vernier micropattern; visual measurement; Accuracy; Capacitive sensors; Equations; Image resolution; Position measurement; Visualization;
Conference_Titel :
Optomechatronic Technologies (ISOT), 2012 International Symposium on
Conference_Location :
Paris
Print_ISBN :
978-1-4673-2875-3
DOI :
10.1109/ISOT.2012.6403278