Title :
Integrated hybrid III–V/Si laser and transmitter
Author :
Duan, Guang-Hua. ; Jany, C. ; Le Liepvre, A. ; Lamponi, Marco ; Accard, A. ; Poingt, F. ; Make, Dalila ; Lelarge, F. ; Messaoudene, S. ; Bordel, D. ; Fedeli, Jean-Marc ; Keyvaninia, S. ; Roelkens, Gunther ; Van Thourhout, Dries ; Thomson, David J. ; Garde
Author_Institution :
III-V Lab., Alcatel-Thales, Palaiseau, France
Abstract :
This paper reports on recent advances on integrated hybrid InP/SOI lasers and transmitters. Based on a molecular wafer bonding technique, we develop hybrid III-V/Si lasers exhibiting new features: narrow III-V waveguide width of less than 3 μm, tapered III-V and silicon waveguides for mode transfer. These new features lead to good laser performances: a lasing threshold as low as 30mA and an output power of more than 10 mW at room temperature in continuous wave operation regime from a single facet. Continuous wave lasing up to 70°C is obtained. Moreover, hybrid III-V/Si lasers, integrating two intra-cavity ring resonators, are fabricated. Such lasers achieve a thermal tuning range of 45 nm, with a side mode suppression ratio higher than 40 dB. More recently we demonstrate a tunable transmitter, integrating a hybrid III-V/Si laser fabricated by wafer bonding and a silicon Mach-Zehnder modulator. The integrated transmitter exhibits 9 nm wavelength tunability by heating an intra-cavity ring resonator, high extinction ratio from 6 to 10 dB, and excellent bit-error-rate performance at 10 Gb/s.
Keywords :
III-V semiconductors; elemental semiconductors; heat treatment; indium compounds; integrated optics; laser cavity resonators; laser modes; optical fabrication; optical materials; optical modulation; optical transmitters; silicon; waveguide lasers; InP-Si; SOI; bit rate 10 Gbit/s; bit-error-rate performance; continuous wave lasing operation; extinction ratio; heating; integrated hybrid III-V-silicon laser; integrated hybrid III-V-silicon transmitter; integrated optics; intracavity ring resonators; lasing threshold; mode transfer; molecular wafer bonding method; narrow Ill-V waveguide width; noise figure 6 dB to 10 dB; optical fabrication; side mode suppression ratio; silicon Mach-Zehnder modulator; silicon waveguide; temperature 293 K to 298 K; thermal tuning; wavelength 45 nm; wavelength 9 nm; Indium phosphide; Laser modes; Optical transmitters; Optical waveguides; Ring lasers; Silicon; Waveguide lasers; Hybrid integrated circuits; adiabatic taper; silicon laser; silicon-on-insulator (SOI) technology;
Conference_Titel :
Indium Phosphide and Related Materials (IPRM), 2012 International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
978-1-4673-1725-2
DOI :
10.1109/ICIPRM.2012.6403306