DocumentCode
58891
Title
CMOS Junctionless Field-Effect Transistors Manufacturing Cost Evaluation
Author
Wen, S.M. ; Chi On Chui
Author_Institution
Dept. of Electr. Eng., Univ. of California, Los Angeles, Los Angeles, CA, USA
Volume
26
Issue
1
fYear
2013
fDate
Feb. 2013
Firstpage
162
Lastpage
168
Abstract
Junctionless field-effect transistors (JL-FETs) contain no doping gradients, so they are thought to be simpler to process and less costly to manufacture than fin field-effect transistors (FinFETs). To check this assertion, process flows for CMOS JL-FETs on 300 mm SOI and bulk silicon substrates with 22 nm gate length are developed, and the manufacturing costs are calculated using a cost-of-ownership based approach. It has been determined that for a given substrate, the cost of the given JL-FET process flows is comparable with FinFET processing with less than 2% cost difference, while JL-FET processing on SOI costs are greater than 10% on bulk silicon. The largest component of process cost is due to photolithography.
Keywords
CMOS integrated circuits; MOSFET; photolithography; semiconductor device manufacture; silicon-on-insulator; CMOS JL-FET; CMOS junctionless field-effect transistors; FinFET; SOI costs; bulk silicon substrates; fin field-effect transistors; manufacturing cost evaluation; photolithography; size 300 mm; Doping; Epitaxial growth; FinFETs; Lithography; Logic gates; Silicon; Substrates; Fin field-effect transistor (FinFET); junctionless; manufacturability; semiconductor processing;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2012.2225648
Filename
6334481
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