• DocumentCode
    58891
  • Title

    CMOS Junctionless Field-Effect Transistors Manufacturing Cost Evaluation

  • Author

    Wen, S.M. ; Chi On Chui

  • Author_Institution
    Dept. of Electr. Eng., Univ. of California, Los Angeles, Los Angeles, CA, USA
  • Volume
    26
  • Issue
    1
  • fYear
    2013
  • fDate
    Feb. 2013
  • Firstpage
    162
  • Lastpage
    168
  • Abstract
    Junctionless field-effect transistors (JL-FETs) contain no doping gradients, so they are thought to be simpler to process and less costly to manufacture than fin field-effect transistors (FinFETs). To check this assertion, process flows for CMOS JL-FETs on 300 mm SOI and bulk silicon substrates with 22 nm gate length are developed, and the manufacturing costs are calculated using a cost-of-ownership based approach. It has been determined that for a given substrate, the cost of the given JL-FET process flows is comparable with FinFET processing with less than 2% cost difference, while JL-FET processing on SOI costs are greater than 10% on bulk silicon. The largest component of process cost is due to photolithography.
  • Keywords
    CMOS integrated circuits; MOSFET; photolithography; semiconductor device manufacture; silicon-on-insulator; CMOS JL-FET; CMOS junctionless field-effect transistors; FinFET; SOI costs; bulk silicon substrates; fin field-effect transistors; manufacturing cost evaluation; photolithography; size 300 mm; Doping; Epitaxial growth; FinFETs; Lithography; Logic gates; Silicon; Substrates; Fin field-effect transistor (FinFET); junctionless; manufacturability; semiconductor processing;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2012.2225648
  • Filename
    6334481