DocumentCode :
58967
Title :
First Principle Simulations of Various Magnetic Tunnel Junctions \\ker n-2pt for \\ker n-2pt
Author :
Chakraverty, Mayank ; Kittur, Harish M. ; Kumar, Pattem Ashok
Author_Institution :
IBM, Bangalore, India
Volume :
12
Issue :
6
fYear :
2013
fDate :
Nov. 2013
Firstpage :
971
Lastpage :
977
Abstract :
This paper reports the first principle simulations of Fe/MgO/Fe, Fe/Y2O3/Fe, Fe/HfO2/Fe, and Fe/Al2O3/Fe magnetic tunnel junctions (MTJs). From the device-level and circuit-level simulations carried out in this paper, the Fe/MgO/Fe configuration has been found to be the best. From the device-level simulations, all the four configurations of MTJs have been compared with regards to the bias dependence of tunnel magnetoresistance ratios (TMRs), insulator thickness dependence of TMR, and insulator thickness dependence of parallel and antiparallel state resistances. Finally, from the circuit-level simulations, the static and switching power dissipations have been computed along with the delay time estimation.
Keywords :
hafnium compounds; iron; magnesium compounds; random-access storage; yttrium compounds; Fe-Al2O3-Fe; Fe-HfO2-Fe; Fe-MgO-Fe; Fe-Y2O3-Fe; antiparallel state resistances; circuit-level simulations; device-level simulations; insulator thickness dependence; magnetic tunnel junctions; magnetoresistive random access memories; tunnel magnetoresistance ratios; Atomic layer deposition; Insulators; Iron; Magnetic separation; Magnetic tunneling; Resistance; Tunneling magnetoresistance; Density functional theory (DFT); MRAM; local spin density approximation (LSDA); magnetic tunnel junction (MTJ);
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2013.2274902
Filename :
6568905
Link To Document :
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