DocumentCode
590552
Title
Fabrication and electrical characterization of bottom-up silicon nanowire resonators
Author
Sansa, M. ; Paulo, A.S. ; Perez-Murano, F.
Author_Institution
CNM, IMB, UAB, Bellaterra, Spain
fYear
2012
fDate
28-31 Oct. 2012
Firstpage
1
Lastpage
4
Abstract
We present the fabrication and electrical characterization of nanomechanical resonators based on bottom-up grown silicon nanowires. The high piezoresistance coefficients of these nanowires provide an intrinsic transduction mechanism with good performance at high frequencies. We have characterized the frequency response of double clamped silicon nanowires with diameters of less than 100 nm. In particular, we have studied the first and second resonance modes, at frequencies higher than 190 MHz. We have observed the splitting of each resonance mode in two orthogonal vibration modes, which is attributed to the break-down of the axial symmetry of the nanowires. This effect can be used to improve the mass sensing performance of the devices.
Keywords
elemental semiconductors; micromechanical resonators; nanowires; piezoresistance; silicon; Si; bottom-up silicon nanowire resonator fabrication; electrical characterization; high piezoresistance coefficient; intrinsic transduction mechanism; mass sensing; orthogonal vibration mode; resonance mode; Frequency measurement; Frequency modulation; Frequency response; Nanobioscience; Resonant frequency; Sensors; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2012 IEEE
Conference_Location
Taipei
ISSN
1930-0395
Print_ISBN
978-1-4577-1766-6
Electronic_ISBN
1930-0395
Type
conf
DOI
10.1109/ICSENS.2012.6411456
Filename
6411456
Link To Document