DocumentCode :
594349
Title :
High-Q 3D embedded inductors using TSV for RF MEMS tunable bandpass filters (4.65–6.8 GHz)
Author :
Vitale, W.A. ; Fernandez-Bolanos, M. ; Ionescu, A.M.
Author_Institution :
Nanoelectronic Device Lab. (NanoLab), Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
fYear :
2012
fDate :
Oct. 29 2012-Nov. 1 2012
Firstpage :
1202
Lastpage :
1205
Abstract :
This paper presents the optimization design of 3D integrated inductors exploiting through silicon vias (TSV) technology to improve the quality (Q) factor in the 2-20 GHz range. The embedded inductor allows the heterogeneous integration with CMOS and MEMS components in a size-compact and low-cost manufacturing process. Results limited to our manufacturing possibilities (5.5×15 μ m-area tungsten TSVs, high resistivity (HR) silicon substrate) show Q-factor values as high as 35 at 8 GHz for 4.8 nH inductance, and design methods to improve them. These inductors are attractive to be used with MEMS capacitors for reconfigurable RFICs, as proposed for a tunable passband filter in the range 4.65 - 6.8 GHz. The filter shows 15% continuous linear center frequency tuning and over 45% in a digital fashion. The filter is also continuously tunable in bandwidth (up to 40%) while keeping constant the center frequency.
Keywords :
CMOS integrated circuits; Q-factor; band-pass filters; inductors; manufacturing processes; micromechanical devices; microwave filters; microwave integrated circuits; semiconductor industry; three-dimensional integrated circuits; CMOS components; HR; MEMS capacitors; Q-factor; RF MEMS tunable bandpass filters; TSV technology; continuous linear center frequency tuning; frequency 2 GHz to 20 GHz; heterogeneous integration; high resistivity; high-Q 3D embedded inductors; low-cost manufacturing process; optimization design; quality factor; reconfigurable RFIC; silicon substrate; size-compact manufacturing process; through silicon vias technology; Coils; Inductance; Inductors; Micromechanical devices; Q factor; Through-silicon vias; Tuning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (EuMC), 2012 42nd European
Conference_Location :
Amsterdam
Print_ISBN :
978-1-4673-2215-7
Electronic_ISBN :
978-2-87487-026-2
Type :
conf
Filename :
6459120
Link To Document :
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