Title :
Advanced ridge flux analysis for fingerprint minutiae detection
Author :
Ohtsuka, Toshiyuki
Author_Institution :
Dept. of Electron. Eng., Tokyo Nat. Coll. of Technol., Tokyo, Japan
Abstract :
This paper presents new fingerprint minutiae detection by the advanced ridge flux analysis. The considerable processing time taken by the conventional approaches, most of which use the ridge thinning process with a rather large calculation time, is a problem that has recently attracted increased attention. Though Ridge flux analysis method without using thinning process is proposed in order to reduce the computational time, there still remains a problem with low detection accuracy. The proposed approach is applied to detect minutiae by analyzing the curvature of ridge contours to achieve both of the computation time reduction and higher detection accuracy. The experimental results show that the proposed approach can achieve a reduction in calculation time, while achieving the same success detection rate as that of the conventional approaches.
Keywords :
fingerprint identification; object detection; advanced Ridge flux analysis method; computation time reduction; computational time; detection accuracy; fingerprint minutiae detection; processing time; ridge contour curvature; ridge thinning process; Accuracy; Bifurcation; FCC; Fingerprint recognition; Image restoration; Silicon; Vectors;
Conference_Titel :
Pattern Recognition (ICPR), 2012 21st International Conference on
Conference_Location :
Tsukuba
Print_ISBN :
978-1-4673-2216-4