Formation of thick textured carbon film using filtered cathodic vacuum arc technique

In this work, thick textured carbon film (800nm) was grown on Si substrate using filtered cathode vacuum arc technique. Multi-cycle of deposition was performed to avoid the high film stress issue hence improve the film adhesion. Optical microscope was used for delamination check, the bonding composition was investigated using X-Ray photoelectron spectroscopy, and the microstructure of the film was studied using visible Raman spectroscopy. The electrical property was also studied by measuring the resistivity of the film.