• DocumentCode
    597584
  • Title

    Oxide thin film transistors with ink-jet printed In-Ga-Zn oxide channel layer and ITO/IZO source/drain contacts

  • Author

    Wang, Yannan ; Sun, X.W. ; Liu, S.W. ; Kyaw, A.K.K. ; Zhao, J.L.

  • Author_Institution
    Sch. of EEE, Nanyang Technol. Univ., Singapore, Singapore
  • fYear
    2013
  • fDate
    2-4 Jan. 2013
  • Firstpage
    168
  • Lastpage
    171
  • Abstract
    In-Ga-Zn oxide (IGZO) TFTs was fabricated by ink-jet printing technology on a silicon substrate with SiO2 on top. The device fabrication process includes printing ITO electrodes and IGZO semiconductor layer. A typical printed TFT shows a mobility of 0.32 cm2/V s and a contact resistance of ~1 MΩ. Device performance was further improved by inserting an IZO layer between the source/drain electrode and IGZO channel, which results in a contact resistance of 0.05 MΩ, and an enhanced mobility of 0.82 cm2/V s.
  • Keywords
    electrical contacts; indium compounds; ink jet printing; thin film transistors; IGZO TFT; ITO/IZO source/drain contacts; In-Ga-Zn; ink-jet printing technology; oxide channel layer; oxide thin film transistors; Contact resistance; Electrodes; Films; Gallium; Indium tin oxide; Printing; Thin film transistors; In-Ga-Zn oxide; contact resistance; ink-jet printing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2013 IEEE 5th International
  • Conference_Location
    Singapore
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4673-4840-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2013.6465986
  • Filename
    6465986