DocumentCode :
597629
Title :
Ag-doped SiO2/TiO2 hybrid optical sensitive thin films with visible absorption enhancement for diffractive optical element application
Author :
Junlabhut, P. ; Boonruang, S. ; Pecharapa, W.
Author_Institution :
Coll. of Nanotechnol., King Mongkut´´s Inst. of Technol. Ladkrabang, Bangkok, Thailand
fYear :
2013
fDate :
2-4 Jan. 2013
Firstpage :
397
Lastpage :
400
Abstract :
This paper reports the synthesis of Ag-doped SiO2/TiO2 hybrid optical sensitive thin films deposited by sol-gel spin coating technique. The structural properties of thin films were characterized by XRD, TEM and EDX. The optical absorption of the films in visible region measured by UV-VIS can be enhanced by Ag nanoparticles due to surface plasmon resonance effect. Photosensitive film can be utilized as effective photosensitive material for diffractive optical element with controllable period by interference angle using interference lithography technique. AFM was employed to investigate the fabricated patterns. The diffraction pattern highly correlated to the performance of diffractive optical element is scrutinized.
Keywords :
X-ray chemical analysis; X-ray diffraction; atomic force microscopy; diffractive optical elements; light absorption; optical films; photolithography; silicon compounds; silver; sol-gel processing; spin coating; surface plasmon resonance; thin films; titanium compounds; transmission electron microscopy; ultraviolet spectra; visible spectra; AFM; EDX; SiO2:Ag; TEM; TiO2:Ag; UV-vis spectroscopy; XRD; diffraction pattern; diffractive optical element application; hybrid optical sensitive thin films; interference angle; interference lithography technique; nanoparticles; optical absorption; photosensitive film; photosensitive material; sol-gel spin coating technique; structural property; surface plasmon resonance effect; visible absorption enhancement; visible region; Conferences; Decision support systems; Nanoelectronics; Ag-doped SiO2/TiO2 hybrid film; absorption enhancement and interference lithography technique; photosensitive;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location :
Singapore
ISSN :
2159-3523
Print_ISBN :
978-1-4673-4840-9
Electronic_ISBN :
2159-3523
Type :
conf
DOI :
10.1109/INEC.2013.6466057
Filename :
6466057
Link To Document :
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