Beam focusing by an anisotropic metal-dielectric multilayer structure

Author

Dongdong Li ; Dao Hua Zhang ; Yueke Wang ; Zhengji Xu ; Jun Wang ; Fei Qin ; Wenjuan Wang

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore

fYear

2013

fDate

2-4 Jan. 2013

Firstpage

449

Lastpage

451

Abstract

We demonstrate subwavelength beam focusing by a slab of anisotropic material. The proposed device consists of a slab of anisotropic material on top of which a Chromium layer with a small slit is used as the mask. By carefully designing the thickness of the anisotropic layer, we can selectively modify the phase of different wave components exiting the output surface, so that a subwavelength-sized light spot can be generated as results of near-field constructive interference. Our study showed that a light spot with FWHM of 0.36λ can be generated at optical frequencies.

Keywords

dielectric materials; electron beam focusing; metal-insulator boundaries; multilayers; slabs; FWHM; anisotropic layer thickness; anisotropic metal-dielectric multilayer structure; chromium layer; near-field constructive interference; optical frequencies; slab; subwavelength beam focusing; subwavelength-sized light spot; Conferences; Decision support systems; Nanoelectronics; anisotropic; beam focusing; metal-dielectric;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanoelectronics Conference (INEC), 2013 IEEE 5th International

Conference_Location

Singapore

ISSN

2159-3523

Print_ISBN

978-1-4673-4840-9

Electronic_ISBN

2159-3523

Type

conf

DOI

10.1109/INEC.2013.6466074

Filename

6466074