On the modeling of process variations and its applications for circuit performance designs

Author

Ma, Jiaxin ; Wenwei Yang ; Lianfeng Yang ; Lifeng Wu ; Zhihong Liu

Author_Institution

ProPlus Design Solutions Inc., San Jose, CA, USA

fYear

2012

fDate

Oct. 29 2012-Nov. 1 2012

Firstpage

1

Lastpage

4

Abstract

This paper gives an overview of statistical modeling and circuit simulation including PVT, Monte Carlo and high Sigma for advanced CMOS process variation. The methodologies of generating corner and statistical models considering all related process effects, especially variation correlation, are discussed. The significance and usefulness of the statistical models are demonstrated. The statistical circuit design applications based on the generated statistical models approaches are also explored.

Keywords

CMOS integrated circuits; Monte Carlo methods; integrated circuit design; integrated circuit modelling; Monte Carlo; PVT; advanced CMOS process variation; circuit performance design; circuit simulation; generated statistical model approach; process effects; process variation modeling; statistical circuit design application; statistical modeling; variation correlation; Correlation; Data models; Integrated circuit modeling; Logic gates; MOS devices; Monte Carlo methods; Semiconductor device modeling;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on

Conference_Location

Xi´an

Print_ISBN

978-1-4673-2474-8

Type

conf

DOI

10.1109/ICSICT.2012.6467638

Filename

6467638