Title :
On the modeling of process variations and its applications for circuit performance designs
Author :
Ma, Jiaxin ; Wenwei Yang ; Lianfeng Yang ; Lifeng Wu ; Zhihong Liu
Author_Institution :
ProPlus Design Solutions Inc., San Jose, CA, USA
fDate :
Oct. 29 2012-Nov. 1 2012
Abstract :
This paper gives an overview of statistical modeling and circuit simulation including PVT, Monte Carlo and high Sigma for advanced CMOS process variation. The methodologies of generating corner and statistical models considering all related process effects, especially variation correlation, are discussed. The significance and usefulness of the statistical models are demonstrated. The statistical circuit design applications based on the generated statistical models approaches are also explored.
Keywords :
CMOS integrated circuits; Monte Carlo methods; integrated circuit design; integrated circuit modelling; Monte Carlo; PVT; advanced CMOS process variation; circuit performance design; circuit simulation; generated statistical model approach; process effects; process variation modeling; statistical circuit design application; statistical modeling; variation correlation; Correlation; Data models; Integrated circuit modeling; Logic gates; MOS devices; Monte Carlo methods; Semiconductor device modeling;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
DOI :
10.1109/ICSICT.2012.6467638
