Analytical modeling of collisionless triple frequency capacitive sheath

Author

Rahman, M.T. ; Dewan, M.N.A. ; Chowdhury, M.R.H.

Author_Institution

Dept. of Electr. & Electron. Eng., Bangladesh Univ. of Eng. & Technol., Dhaka, Bangladesh

fYear

2012

fDate

20-22 Dec. 2012

Firstpage

717

Lastpage

720

Abstract

A self-consistent model for collisionless capacitively coupled plasma (CCP) sheath driven by triple frequency (TF) RF source has been developed. This work established analytical expressions for sheath parameters based on the assumptions of time independent collisionless ion motion and inertialess electrons. The parameters calculated using the present model are compared with those calculated using a single frequency model and a dual frequency model for time independent collisionless case. The effects of frequency ratio on sheath potential and sheath width are also investigated.

Keywords

plasma sheaths; TF RF source; analytical modeling; collisionless capacitively-coupled plasma sheath; collisionless triple-frequency capacitive sheath; dual-frequency model; frequency ratio; inertialess electrons; self-consistent model; sheath potential; sheath width; single-frequency model; time-independent collisionless ion motion; Electric fields; Electric potential; Hafnium; Mathematical model; Plasmas; Radio frequency; Time-frequency analysis; Capacitively coupled plasma; Collisionless sheath; RF plasma; Triple frequency; time-independent ion motion;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical & Computer Engineering (ICECE), 2012 7th International Conference on

Conference_Location

Dhaka

Print_ISBN

978-1-4673-1434-3

Type

conf

DOI

10.1109/ICECE.2012.6471651

Filename

6471651