DocumentCode
599842
Title
Droplet epitaxy of strain-free GaAs/AlGaAs quantum molecules for optoelectronic applications
Author
Lei, W. ; Parkinson, P. ; Tan, H.H. ; Jagadish, C.
Author_Institution
Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
fYear
2012
fDate
12-14 Dec. 2012
Firstpage
53
Lastpage
54
Abstract
This work presents a pioneering study on the MOCVD droplet epitaxy of strain-free GaAs/Al0.3Ga0.7As quantum molecules. By choosing the appropriate growth conditions, GaAs quantum molecules can be obtained with controlled size and density. The formation of these molecules is mainly due to the anisotropic migration of Ga adatoms and the edge enhanced crystallization process. Furthermore, these molecules show excellent optical properties, suggesting their promising applications in devices such as infrared photodetectors and quantum information processing.
Keywords
III-V semiconductors; MOCVD; aluminium compounds; drops; gallium arsenide; optoelectronic devices; semiconductor quantum dots; Ga adatoms; GaAs-Al0.3Ga0.7As; MOCVD droplet epitaxy; anisotropic migration; appropriate growth conditions; controlled density; controlled size; edge enhanced crystallization; optical properties; optoelectronic applications; strain-free GaAs/AlGaAs quantum molecules; Epitaxial growth; Gallium arsenide; MOCVD; Nanostructures; Optical devices; Optical imaging; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location
Melbourne, VIC
ISSN
1097-2137
Print_ISBN
978-1-4673-3047-3
Type
conf
DOI
10.1109/COMMAD.2012.6472356
Filename
6472356
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