• DocumentCode
    599842
  • Title

    Droplet epitaxy of strain-free GaAs/AlGaAs quantum molecules for optoelectronic applications

  • Author

    Lei, W. ; Parkinson, P. ; Tan, H.H. ; Jagadish, C.

  • Author_Institution
    Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
  • fYear
    2012
  • fDate
    12-14 Dec. 2012
  • Firstpage
    53
  • Lastpage
    54
  • Abstract
    This work presents a pioneering study on the MOCVD droplet epitaxy of strain-free GaAs/Al0.3Ga0.7As quantum molecules. By choosing the appropriate growth conditions, GaAs quantum molecules can be obtained with controlled size and density. The formation of these molecules is mainly due to the anisotropic migration of Ga adatoms and the edge enhanced crystallization process. Furthermore, these molecules show excellent optical properties, suggesting their promising applications in devices such as infrared photodetectors and quantum information processing.
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; drops; gallium arsenide; optoelectronic devices; semiconductor quantum dots; Ga adatoms; GaAs-Al0.3Ga0.7As; MOCVD droplet epitaxy; anisotropic migration; appropriate growth conditions; controlled density; controlled size; edge enhanced crystallization; optical properties; optoelectronic applications; strain-free GaAs/AlGaAs quantum molecules; Epitaxial growth; Gallium arsenide; MOCVD; Nanostructures; Optical devices; Optical imaging; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
  • Conference_Location
    Melbourne, VIC
  • ISSN
    1097-2137
  • Print_ISBN
    978-1-4673-3047-3
  • Type

    conf

  • DOI
    10.1109/COMMAD.2012.6472356
  • Filename
    6472356