• DocumentCode
    599901
  • Title

    Fluorination of single-walled carbon nanotubes via CHF3 plasma

  • Author

    Lee, Kin Keung ; Li, Yuhua

  • Author_Institution
    Centre for Quantum Comput. & Commun. Technol., Univ. of Melbourne, Melbourne, VIC, Australia
  • fYear
    2012
  • fDate
    12-14 Dec. 2012
  • Firstpage
    175
  • Lastpage
    176
  • Abstract
    In this study, we modified single-walled carbon nanotubes (SWCNTs) by CHF3 plasma generated by reactive-ion etching (RIE) reactor. X-ray photo-electron spectroscopy (XPS) indicated fluorine atoms were attached to the side wall of CNTs. Static contact angle (CA) measurements indicated a very significant increase in the water contact angle from 65° for pristine CNTs to 170° for the doped SWCNTs.
  • Keywords
    X-ray photoelectron spectra; carbon nanotubes; contact angle; fluorine; plasma materials processing; sputter etching; C:F; CHF3 plasma; X-ray photoelectron spectroscopy; XPS; fluorination; fluorine atoms; reactive-ion etching reactor; single-walled carbon nanotubes; static contact angle; water contact angle; Carbon; Carbon nanotubes; Educational institutions; Plasma measurements; Plasmas; Spectroscopy; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
  • Conference_Location
    Melbourne, VIC
  • ISSN
    1097-2137
  • Print_ISBN
    978-1-4673-3047-3
  • Type

    conf

  • DOI
    10.1109/COMMAD.2012.6472417
  • Filename
    6472417
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=599901