Title :
Nanotribological behaviors of friction-induced hillocks on monocrystalline silicon
Author :
Long Hua ; Bingjun Yu ; Chenfei Song ; Linmao Qian ; Zhongrong Zhou
Author_Institution :
Nat. Traction Power Lab., Southwest Jiaotong Univ., Chengdu, China
fDate :
Aug. 29 2012-Sept. 1 2012
Abstract :
With an atomic force microscope, friction and wear behaviors of the friction induced hillocks on monocrystalline silicon were investigated. With the increase of normal load from one to twelve microNewtown, the friction force on silicon substrate showed a sharp increase at eight microNewtown, while the friction force on the hillocks kept a stably linear increase. Since no scratch damage was detected on the hillock below a contact pressure of ten point three gigaPascal, the friction induced hillocks on silicon can withstand the typical contact and sliding in dynamic devices. It was also noted that the friction induced hillock presented anisotropic friction and wear behaviors during scratching. The sliding parallel to the scanning direction for producing the hillock can reduce the friction in dynamic devices. This study can shed new light on potential application of the friction induced nanostructures.
Keywords :
atomic force microscopy; crystal structure; elemental semiconductors; mechanical contact; silicon; sliding friction; wear; Si; anisotropic friction; atomic force microscopy; contact pressure; dynamic devices; friction force; friction induced hillocks; friction induced nanostructures; microNewtown; monocrystalline silicon substrate; nanotribological behaviors; potential application; scanning direction; scratch damage; scratching; sliding; wear behaviors; Atomic force microscopy; Force; Friction; Micromechanical devices; Silicon; Surface topography; friction induced hillock; monocrystalline silicon; nanofabrication;
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2012 International Conference on
Conference_Location :
Shaanxi
Print_ISBN :
978-1-4673-4588-0
Electronic_ISBN :
978-1-4673-4589-7
DOI :
10.1109/3M-NANO.2012.6472950