DocumentCode :
600053
Title :
Optimization of thin film deposition using multi-parametric surface plasmon resonance: A new technique to determine thickness and refractive index of thin and thick layers
Author :
Kuncova-Kallio, J. ; Tuppurainen, Jussi-Pekka ; Sadowski, Janusz W. ; Granqvist, Niko
Author_Institution :
BioNavis Ltd., Tampere, Finland
fYear :
2012
fDate :
Aug. 29 2012-Sept. 1 2012
Firstpage :
347
Lastpage :
350
Abstract :
We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.
Keywords :
refractive index; surface plasmon resonance; thin films; vacuum deposition; MP-SPR; inorganic layers; interaction components; interaction kinetics; metallic layers; multiparametric surface plasmon resonance; organic layers; refractive index; thick film thickness; thin film deposition; ultrathin film thickness; vacuum evaporation; Materials; Optical surface waves; Plasmons; Refractive index; Thickness measurement; Wavelength measurement; SPR; characterization; multi-parametric surface plasmon resonance; process optimization; refractive index; thickness; thin film deposition; ultrathin film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2012 International Conference on
Conference_Location :
Shaanxi
Print_ISBN :
978-1-4673-4588-0
Electronic_ISBN :
978-1-4673-4589-7
Type :
conf
DOI :
10.1109/3M-NANO.2012.6472952
Filename :
6472952
Link To Document :
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