EMI noise reduction in an integrated 6 kHz solid state pulsed power system

Solid state pulsed power systems have been designed and implemented in Cymer´s Deep Ultraviolet (DUV) lithography light source products for over 20 years. Product reliability is critical for semiconductor photolithography processing and is driven by a host of factors including reliable operation of the solid state pulsed power and control systems. The reliability of the integrated system depends not only on its dedicated pulsed power designs (for example, charging system, magnetic compression pulse forming network (PFN), thermal management, etc.), but also on the impact of electromagnetic interference (EMI) on its internal sensors and the communication of the control system. Unfortunately, there are times when conventional EM noise suppression designs may prove to be insufficient to ensure robust operation of the integrated systems that may be exposed to harsh environments created by high voltage pulse transient discharges. Additional efforts may be required to identify the noise sources and mitigate their adverse effects. This paper presents the findings of a recent investigation of EMI from a 6 kHz pulsed power magnetic compression system and offers a viable design solution for reducing the noise susceptibility in the integrated temperature sensor system.