DocumentCode
602365
Title
The impact of stencil aperture design for next generation ultra-fine pitch printing
Author
Whitmore, M. ; Schake, J. ; Ashmore, C.
Author_Institution
DEK Printing Machines Ltd., Weymouth, UK
fYear
2012
fDate
6-8 Nov. 2012
Firstpage
1
Lastpage
7
Abstract
Miniaturisation is pushing the stencil printing process. As features become smaller, solder paste transfer efficiency is becoming more critical. In latest research work, actual paste deposit volumes and transfer efficiency have been monitored and compared for both square and round apertures with area ratio´s ranging from 0.20 thru to 1.35. This covers apertures sizes of between 100 and 550 microns in a nominal 100 micron thick stencil foil. In addition, the effect of ultrasonically activated squeegees (ProActiv) has been assessed as part of the same experiment. A further comparison has also been made between type 4 and type 4.5 solder paste aswell. The data presented here will help provide guidelines for stencil aperture designs and strategies for ultra-fille pitch components such as 0.3CSP´s.
Keywords
fine-pitch technology; solders; ProActiv effect; next generation ultra-fine pitch printing; paste deposit volumes; size 100 micron to 550 micron; solder paste transfer efficiency; stencil aperture design; stencil foil; stencil printing process; ultra-fille pitch components; ultrasonically activated squeegees effect; 0.3mm pitch CSP´s; Paste transfer efficiency; aperture design; area ratio; paste volume; stencil printing; ultra fine pitch components;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Manufacturing Technology Symposium (IEMT), 2012 35th IEEE/CPMT International
Conference_Location
Ipoh
ISSN
1089-8190
Print_ISBN
978-1-4673-4384-8
Electronic_ISBN
1089-8190
Type
conf
DOI
10.1109/IEMT.2012.6521805
Filename
6521805
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