DocumentCode :
602803
Title :
Split pocket p-n-i-n tunnel field-effect transistors
Author :
Verreck, D. ; Verhulst, Anne S. ; Groeseneken, Guido
Author_Institution :
imec, Leuven, Belgium
fYear :
2013
fDate :
19-21 March 2013
Firstpage :
21
Lastpage :
24
Abstract :
In the search for a sufficiently high on-current in tunnel field-effect transistors (TFET), the p-n-i-n configuration, featuring a pocket at the source side, has led to improved on-currents and subthreshold swings (SS) compared to the typical p-i-n configuration. We demonstrate through fully quantum mechanical simulations that the SS and off-current of a normally-on p-n-i-n TFET degrade with increasing body thickness. We show that a solution is to decrease the pocket thickness, such that the device becomes normally-off. As an alternative, we present a split pocket configuration, which delivers a similar SS and on-current enhancement as a full pocket configuration, while being almost insensitive to body thickness. Thicker split pockets than full pockets are possible, while maintaining the performance enhancement compared to a p-i-n TFET.
Keywords :
field effect transistors; fully quantum mechanical simulations; normally-on p-n-i-n TFET; on-current enhancement; split pocket configuration; split pocket p-n-i-n TFET; split pocket p-n-i-n tunnel field-effect transistors; subthreshold swings; Artificial intelligence; Indium gallium arsenide; Logic gates; Silicon; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on
Conference_Location :
Coventry
Print_ISBN :
978-1-4673-4800-3
Electronic_ISBN :
978-1-4673-4801-0
Type :
conf
DOI :
10.1109/ULIS.2013.6523481
Filename :
6523481
Link To Document :
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