DocumentCode
602831
Title
Ab initio validation of continuum models for Si/SiO2 interfaces
Author
Biel, B. ; Donetti, L. ; Godoy, Andres ; Gamiz, F.J.
Author_Institution
Dipt. Electron. y Tecnol. de Comput., Campus de Fuente Nueva Univ. de Granada, Granada, Spain
fYear
2013
fDate
19-21 March 2013
Firstpage
165
Lastpage
168
Abstract
A Density Functional Theory study on the scaling properties of SOI nanostructures is provided in this work. Starting from an atomistic, purely quantum-mechanical treatment of the nanostructures, we analyze the bandstructures and bandgap values to extract the main trends in their behaviours as the size of the nanodevices goes down. We compare the ab initio bandstructures with the ones obtained by means of k·p calculations, to determine the actual range of device dimensions for which the use of atomistic tools is mandatory, and whether traditional device simulation in such a range can be improved by using atomistic methods for each device type.
Keywords
ab initio calculations; band structure; density functional theory; k.p calculations; nanostructured materials; quantum theory; silicon; silicon compounds; silicon-on-insulator; SOI nanostructures; Si-SiO2; ab initio validation; atomistic methods; band structures; bandgap values; continuum models; density functional theory; k·p calculations; nanodevices; quantum-mechanical treatment; scaling properties; Silicon; Tin; SOI; SiO2 ; ab initio; interfaces; k·p;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on
Conference_Location
Coventry
Print_ISBN
978-1-4673-4800-3
Electronic_ISBN
978-1-4673-4801-0
Type
conf
DOI
10.1109/ULIS.2013.6523509
Filename
6523509
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