• DocumentCode
    602831
  • Title

    Ab initio validation of continuum models for Si/SiO2 interfaces

  • Author

    Biel, B. ; Donetti, L. ; Godoy, Andres ; Gamiz, F.J.

  • Author_Institution
    Dipt. Electron. y Tecnol. de Comput., Campus de Fuente Nueva Univ. de Granada, Granada, Spain
  • fYear
    2013
  • fDate
    19-21 March 2013
  • Firstpage
    165
  • Lastpage
    168
  • Abstract
    A Density Functional Theory study on the scaling properties of SOI nanostructures is provided in this work. Starting from an atomistic, purely quantum-mechanical treatment of the nanostructures, we analyze the bandstructures and bandgap values to extract the main trends in their behaviours as the size of the nanodevices goes down. We compare the ab initio bandstructures with the ones obtained by means of k·p calculations, to determine the actual range of device dimensions for which the use of atomistic tools is mandatory, and whether traditional device simulation in such a range can be improved by using atomistic methods for each device type.
  • Keywords
    ab initio calculations; band structure; density functional theory; k.p calculations; nanostructured materials; quantum theory; silicon; silicon compounds; silicon-on-insulator; SOI nanostructures; Si-SiO2; ab initio validation; atomistic methods; band structures; bandgap values; continuum models; density functional theory; k·p calculations; nanodevices; quantum-mechanical treatment; scaling properties; Silicon; Tin; SOI; SiO2; ab initio; interfaces; k·p;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on
  • Conference_Location
    Coventry
  • Print_ISBN
    978-1-4673-4800-3
  • Electronic_ISBN
    978-1-4673-4801-0
  • Type

    conf

  • DOI
    10.1109/ULIS.2013.6523509
  • Filename
    6523509