Title :
Self-impact of NBTI effect on the degradation rate of threshold voltage in PMOS transistors
Author :
Eghbalkhah, B. ; Gharavi, S.A.K. ; Afzali-Kusha, Ali ; Ghaznavi-Ghoushchi, M.B.
Author_Institution :
Sch. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
Abstract :
Reliability aware circuit design and estimation of circuit performance during lifetime is a critical challenge in design and test of integrated circuits in nanometer technology nodes. Negative Bias Temperature Instability (NBTI) as the most dominant aging source is deeply dependent on the operating temperature of the circuit. In this work, we have developed a simulation framework to dynamically estimate the effect of NBTI on power consumption of the circuit and consequently the operating temperature. The effect of NBTI on temperature will act as a natural negative feedback mechanism to reduce the degradation rate of threshold voltage (Vth). Simulation results show that estimated degradation in Vth is about 4.1% less than the predicted amount by current models.
Keywords :
MOSFET; integrated circuit design; integrated circuit reliability; integrated circuit testing; negative bias temperature instability; NBTI effect; PMOS transistors; aging source; circuit performance estimation; integrated circuit design; integrated circuit testing; natural negative feedback mechanism; negative bias temperature instability; power consumption; reliability aware circuit design; threshold voltage degradation rate reduction; Degradation; Integrated circuit modeling; Logic gates; Power demand; Stress; Temperature dependence; Threshold voltage;
Conference_Titel :
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2013 8th International Conference on
Conference_Location :
Abu Dhabi
Print_ISBN :
978-1-4673-6039-5
Electronic_ISBN :
978-1-4673-6038-8
DOI :
10.1109/DTIS.2013.6527796