DocumentCode
605499
Title
Self-impact of NBTI effect on the degradation rate of threshold voltage in PMOS transistors
Author
Eghbalkhah, B. ; Gharavi, S.A.K. ; Afzali-Kusha, Ali ; Ghaznavi-Ghoushchi, M.B.
Author_Institution
Sch. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
fYear
2013
fDate
26-28 March 2013
Firstpage
151
Lastpage
154
Abstract
Reliability aware circuit design and estimation of circuit performance during lifetime is a critical challenge in design and test of integrated circuits in nanometer technology nodes. Negative Bias Temperature Instability (NBTI) as the most dominant aging source is deeply dependent on the operating temperature of the circuit. In this work, we have developed a simulation framework to dynamically estimate the effect of NBTI on power consumption of the circuit and consequently the operating temperature. The effect of NBTI on temperature will act as a natural negative feedback mechanism to reduce the degradation rate of threshold voltage (Vth). Simulation results show that estimated degradation in Vth is about 4.1% less than the predicted amount by current models.
Keywords
MOSFET; integrated circuit design; integrated circuit reliability; integrated circuit testing; negative bias temperature instability; NBTI effect; PMOS transistors; aging source; circuit performance estimation; integrated circuit design; integrated circuit testing; natural negative feedback mechanism; negative bias temperature instability; power consumption; reliability aware circuit design; threshold voltage degradation rate reduction; Degradation; Integrated circuit modeling; Logic gates; Power demand; Stress; Temperature dependence; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2013 8th International Conference on
Conference_Location
Abu Dhabi
Print_ISBN
978-1-4673-6039-5
Electronic_ISBN
978-1-4673-6038-8
Type
conf
DOI
10.1109/DTIS.2013.6527796
Filename
6527796
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