DocumentCode
605543
Title
Process control monitors for individual single-walled carbon nanotube transistor fabrication processes
Author
Chikkadi, K. ; Haluska, M. ; Hierold, C. ; Roman, Costica
Author_Institution
Dept. of Mech. & Process Eng., ETH Zurich, Zurich, Switzerland
fYear
2013
fDate
25-28 March 2013
Firstpage
173
Lastpage
177
Abstract
The manufacturing yield of carbon nanotube transistors is very sensitive to changes in fabrication process parameters, while controlling length, density and orientation of nanotubes simultaneously is still proving elusive in batch fabrication processes. Here, we show an electrode design with a yield of up to 45% working transistors despite our batch fabrication process being based on randomly grown nanotubes. Transistor parameter distributions of 765 devices are shown, demonstrating the potential of our design for process monitoring and control.
Keywords
batch processing (industrial); carbon nanotube field effect transistors; electrodes; C; batch fabrication processes; electrode design; fabrication process parameters; manufacturing yield; process control monitors; single walled carbon nanotube transistor fabrication; transistor parameter distributions; Carbon nanotubes; Electrodes; Fabrication; Monitoring; Process control; Transistors; length and density distribution; monte carlo; process monitoring; single-walled carbon nanotube; transistor;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures (ICMTS), 2013 IEEE International Conference on
Conference_Location
Osaka, Japan
ISSN
1071-9032
Print_ISBN
978-1-4673-4845-4
Electronic_ISBN
1071-9032
Type
conf
DOI
10.1109/ICMTS.2013.6528167
Filename
6528167
Link To Document