DocumentCode :
606924
Title :
Strength analysis of advanced node BEOL under CPI induced stresses
Author :
Debecker, B. ; Vanstreels, K. ; Gonzalez, M. ; Vandevelde, B. ; Tokei, Z.
Author_Institution :
Imec, Leuven, Belgium
fYear :
2013
fDate :
14-17 April 2013
Firstpage :
1
Lastpage :
5
Abstract :
At nanoscale level, the strength of the BEOL is determined by two competing failure mechanisms: adhesive failure (delamination) at the different interfaces and cohesive failure within the Cu-vias or in the low-k material. Different approaches to model delamination by FEM are discussed an evaluated. Although the current techniques are useful for qualitative comparison, it is identified that the future challenge for quantitative reliability modeling lies in tackling fracture initiation and mode mixity. Next, it is examined how the risk for cohesive and adhesive failure evolves in function of the stiffness of the low-k. The potential of our approach is demonstrated by the simulation of different failure mechanisms in some comparative cases.
Keywords :
copper alloys; delamination; electronics packaging; failure analysis; finite element analysis; fracture toughness; low-k dielectric thin films; nanoelectronics; stress analysis; CPI induced stresses; Cu; FEM; adhesive failure; advanced node BEOL; back-end-of-line; chip package interaction induced stress; cohesive failure; delamination model; failure mechanisms; fracture initiation; low-k material; nanoscale level; quantitative reliability modeling; stiffness function; strength analysis; Abstracts; Finite element analysis; Guidelines; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE), 2013 14th International Conference on
Conference_Location :
Wroclaw
Print_ISBN :
978-1-4673-6138-5
Type :
conf
DOI :
10.1109/EuroSimE.2013.6529985
Filename :
6529985
Link To Document :
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