• DocumentCode
    608222
  • Title

    Investigation of the role of electrodes on the retention performance of HfOx based RRAM cells by experiments, atomistic simulations and device physical modeling

  • Author

    Traore, B. ; Xue, Kaiping ; Vianello, E. ; Molas, G. ; Blaise, P. ; De Salvo, B. ; Padovani, A. ; Pirrotta, O. ; Larcher, Luca ; Fonseca, L.R.C. ; Nishi, Yoshio

  • Author_Institution
    LTMA (Lab. des Technol. Memoires Av.), MINATEC Campus, Grenoble, France
  • fYear
    2013
  • fDate
    14-18 April 2013
  • Abstract
    In this work we investigate in detail the effects of metal electrodes on the retention performances of HfOx RRAM devices. Motivated by our experimental data, we employ physics-based RRAM modeling and first-principles calculations to show that during the ON-state the concentration of oxygen interstitial (Oi) ions in the oxide depends significantly on the metal electrodes, being much larger for RRAM devices with Pt electrodes compared with Ti. The lower Oi concentration in HfOx with Ti electrodes, known as a strong oxygen getter material, results in improved retention and thermal stability. The presence of oxygen deficient conductive filaments explains the data.
  • Keywords
    ab initio calculations; circuit simulation; circuit stability; conducting materials; electrochemical electrodes; hafnium compounds; platinum; random-access storage; thermal stability; titanium; titanium compounds; Pt-Pt-HfOx; RRAM cell device; TiN-Ti-HfOx; atomistic simulation; conductive filament; first-principle calculation; metal electrode; oxygen interstitial ion concentration; physical modeling; physics-based RRAM modeling; retention performance; thermal stability; Electrodes; Hafnium compounds; Switches; Temperature measurement; Thermal stability; Tin; Data retention; Forming voltage; HfO2; OxRAM; Physics-based modeling; ab-initio calculations;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2013 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4799-0112-8
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2013.6532041
  • Filename
    6532041