DocumentCode
608222
Title
Investigation of the role of electrodes on the retention performance of HfOx based RRAM cells by experiments, atomistic simulations and device physical modeling
Author
Traore, B. ; Xue, Kaiping ; Vianello, E. ; Molas, G. ; Blaise, P. ; De Salvo, B. ; Padovani, A. ; Pirrotta, O. ; Larcher, Luca ; Fonseca, L.R.C. ; Nishi, Yoshio
Author_Institution
LTMA (Lab. des Technol. Memoires Av.), MINATEC Campus, Grenoble, France
fYear
2013
fDate
14-18 April 2013
Abstract
In this work we investigate in detail the effects of metal electrodes on the retention performances of HfOx RRAM devices. Motivated by our experimental data, we employ physics-based RRAM modeling and first-principles calculations to show that during the ON-state the concentration of oxygen interstitial (Oi) ions in the oxide depends significantly on the metal electrodes, being much larger for RRAM devices with Pt electrodes compared with Ti. The lower Oi concentration in HfOx with Ti electrodes, known as a strong oxygen getter material, results in improved retention and thermal stability. The presence of oxygen deficient conductive filaments explains the data.
Keywords
ab initio calculations; circuit simulation; circuit stability; conducting materials; electrochemical electrodes; hafnium compounds; platinum; random-access storage; thermal stability; titanium; titanium compounds; Pt-Pt-HfOx; RRAM cell device; TiN-Ti-HfOx; atomistic simulation; conductive filament; first-principle calculation; metal electrode; oxygen interstitial ion concentration; physical modeling; physics-based RRAM modeling; retention performance; thermal stability; Electrodes; Hafnium compounds; Switches; Temperature measurement; Thermal stability; Tin; Data retention; Forming voltage; HfO2 ; OxRAM; Physics-based modeling; ab-initio calculations;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location
Anaheim, CA
ISSN
1541-7026
Print_ISBN
978-1-4799-0112-8
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2013.6532041
Filename
6532041
Link To Document