• DocumentCode
    608247
  • Title

    Effects of Bosch scallops on metal layer stress of an open Through Silicon Via technology

  • Author

    Singulani, A.P. ; Ceric, H. ; Langer, E. ; Carniello, S.

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2013
  • fDate
    14-18 April 2013
  • Abstract
    Through Silicon Via (TSV) is a lead topic in interconnects and 3D integration research, mainly due to numerous anticipated advantages. However, several challenges must still be overcome if large scale production is to be achieved. In this work, we have studied effects of Bosch scallops concerning mechanical reliability for a specific TSV technology. The presence of scallops on the TSV wall modifies the stress distribution along the via. By means of Finite Element Method (FEM) simulations, we could assess this change and understand the process. The achieved results support experiments and give a better insight into the influence of scallops on the stress in an open TSV.
  • Keywords
    finite element analysis; integrated circuit interconnections; integrated circuit reliability; three-dimensional integrated circuits; 3D integration research; Bosch scallops; FEM simulations; TSV wall; finite element method simulations; interconnects; mechanical reliability; metal layer stress; open Through Silicon Via technology; stress distribution; Geometry; Reliability; Silicon; Stress; Through-silicon vias; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2013 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4799-0112-8
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2013.6532066
  • Filename
    6532066