• DocumentCode
    608254
  • Title

    Novel drain-less multi-gate pHEMT for electrostatic discharge (ESD) protection in GaAs technology

  • Author

    Qiang Cui ; Liou, Juin J.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of Central Florida, Orlando, FL, USA
  • fYear
    2013
  • fDate
    14-18 April 2013
  • Abstract
    Electrostatic discharge (ESD) protection structures in GaAs HEMT technology are commonly constructed using either stacked Schottky diode or Single-Gate clamp. Dual-gate pHEMT clamp was also recently reported for its better ESD robustness performance. This paper further develops an improved ESD protection clamp based on a novel drainless, multi-gate pHEMT in 0.5um GaAs pHEMT technology. With similar layout area, the proposed ESD protection clamp can carry much higher current handling ability (5.2-A “It2”, roughly 7.8-kV HBM ESD level) than both the conventional single-gate pHEMT clamp and recently reported dual-gate pHEMT clamp under the human body model (HBM) stress.
  • Keywords
    III-V semiconductors; electrostatic discharge; gallium arsenide; high electron mobility transistors; ESD protection clamp; ESD robustness performance; GaAs; HBM stress; current handling ability; drainless multigate pHEMT; dual-gate pHEMT clamp; electrostatic discharge protection; gallium arsenide HEMT technology; human body model stress; improved ESD protection clamp; layout area; single-gate pHEMT clamp; size 0.5 mum; stacked Schottky diode; Clamps; Electrostatic discharges; Gallium arsenide; Logic gates; PHEMTs; Schottky diodes; ESD; GaAs; HEM; Human Body Model;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium (IRPS), 2013 IEEE International
  • Conference_Location
    Anaheim, CA
  • ISSN
    1541-7026
  • Print_ISBN
    978-1-4799-0112-8
  • Electronic_ISBN
    1541-7026
  • Type

    conf

  • DOI
    10.1109/IRPS.2013.6532073
  • Filename
    6532073