Title :
Recovery behavior in negative bias temperature instability
Author_Institution :
Yokohama Res. Lab., Hitachi, Ltd., Kanagawa, Japan
Abstract :
We have studied the recovery behavior observed in negative bias temperature instability (NBTI) from the aspect of bulk hole traps. Using the maximum entropy method to analyze isochronal annealing data, we evaluated the contributions of bulk hole traps with energy level Et to the initial threshold voltage shifts just after NBT stresses, ΔVOTi(Et). Their shapes are Gaussian-like depending on the NBT stress temperatures, and ΔVOTi(Et) can explain NBTI recovery behaviors as well as the universality. The validity of a previously proposed empirical function describing NBTI recovery curves was confirmed, and the physical meanings of that function were examined. This study proves the importance of hole detrapping events and sheds light on the NBTI recovery mechanism.
Keywords :
MOSFET; annealing; hole traps; maximum entropy methods; NBT stress temperatures; NBT stresses; NBTI recovery behaviors; NBTI recovery curves; NBTI recovery mechanism; bulk hole traps; hole detrapping events; isochronal annealing data; maximum entropy method; negative bias temperature instability; threshold voltage shifts; Annealing; Equations; Logic gates; MOSFET; Mathematical model; Stress; Temperature measurement; Hole trap; Maximum Entropy Method; NBTI; Recovery; Universality;
Conference_Titel :
Reliability Physics Symposium (IRPS), 2013 IEEE International
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-4799-0112-8
Electronic_ISBN :
1541-7026
DOI :
10.1109/IRPS.2013.6532119