• DocumentCode
    61008
  • Title

    Surface Leakage Reduction in MSM InGaAs Photodetector on III–V CMOS Photonics Platform

  • Author

    Yongpeng Cheng ; Ikku, Yuki ; Takenaka, Mitsuru ; Takagi, Shinichi

  • Author_Institution
    Dept. of Electr. Eng. & Inf. Syst., Univ. of Tokyo, Bunkyo̅, Japan
  • Volume
    27
  • Issue
    14
  • fYear
    2015
  • fDate
    July15, 15 2015
  • Firstpage
    1569
  • Lastpage
    1572
  • Abstract
    By evaluating the leakage current components of Ni/InGaAs Schottky junctions, we have revealed that the surface leakage current was dominant in the dark current of the waveguide metal-semiconductor-metal (MSM) InGaAs photodetector (PD) fabricated on the III-V CMOS photonics platform. To suppress the surface leakage, we have investigated the impact of the InAlAs Schottky barrier enhancement (SBE) layer on the surface leakage. It is found that the surface leakage can be significantly reduced by the surface passivation effect of the InAlAs SBE layer in addition to the reduction in the junction bulk leakage. We have also found that the surface passivation by an improper oxide such as Al2O3 on the SBE layer increased the dark current probably due to the fixed charges in the oxide layer. By introducing the InP/InAlAs SBE layer without any oxide passivation, we have successfully demonstrated the low-darkcurrent MSM InGaAs PD which was monolithically integrated with an InP photonic-wire waveguide fabricated on a III-V-on-insulator wafer. When a bias voltage of 1 V was applied, the dark current of 7 nA was obtained with 0.15 A/W responsivity for a 1550-nm wavelength.
  • Keywords
    CMOS integrated circuits; III-V semiconductors; Schottky barriers; alumina; gallium arsenide; indium compounds; integrated optoelectronics; optical fabrication; optical testing; optical waveguides; passivation; photodetectors; Al2O3; III-V CMOS photonic platform; III-V-on-insulator wafer; InP-InAlAs; MSM indium gallium arsenide photodetector fabrication; N-InAlAs; alumina; current 7 nA; indium aluminium arsenide Schottky barrier enhancement layer; indium phosphide photonic-wire waveguide fabrication; indium phosphide-indium aluminium arsenide SBE layer; monolithically integration; nitrogen-indium gallium arsenide Schottky junctions; surface leakage current reduction; surface passivation effect; voltage 1 V; waveguide metal-semiconductor-metal; wavelength 1550 nm; Aluminum oxide; Dark current; Indium gallium arsenide; Indium phosphide; Optical waveguides; Photonics; III-V-on-insulator; III-V-oninsulator; InGaAs; MSM photodetector; Schottky barrier enhancement layer;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2015.2432052
  • Filename
    7105870