DocumentCode
610535
Title
Design and fabrication of lower aspect ratio sub-wavelength grating for polarization separation
Author
Sridharan, Gokul ; Pramitha, V. ; Bhattacharya, Surya
Author_Institution
Dept. of Electr. Eng., IIT Madras, Chennai, India
fYear
2012
fDate
9-12 Dec. 2012
Firstpage
1
Lastpage
3
Abstract
Highly efficient polarization separation requires very high aspect ratio gratings. The simplified modal method allows compromises between height and efficiency. Lower aspect ratio gratings are designed for 633nm and fabricated by e-beam lithography.
Keywords
diffraction gratings; electron beam lithography; light polarisation; optical design techniques; optical fabrication; aspect ratio gratings; design; e-beam lithography; fabrication; polarization separation; subwavelength grating; wavelength 633 nm;
fLanguage
English
Publisher
ieee
Conference_Titel
Fiber Optics and Photonics (PHOTONICS), 2012 International Conference on
Conference_Location
Chennai
Print_ISBN
978-1-4673-4718-1
Type
conf
Filename
6545515
Link To Document