DocumentCode :
610535
Title :
Design and fabrication of lower aspect ratio sub-wavelength grating for polarization separation
Author :
Sridharan, Gokul ; Pramitha, V. ; Bhattacharya, Surya
Author_Institution :
Dept. of Electr. Eng., IIT Madras, Chennai, India
fYear :
2012
fDate :
9-12 Dec. 2012
Firstpage :
1
Lastpage :
3
Abstract :
Highly efficient polarization separation requires very high aspect ratio gratings. The simplified modal method allows compromises between height and efficiency. Lower aspect ratio gratings are designed for 633nm and fabricated by e-beam lithography.
Keywords :
diffraction gratings; electron beam lithography; light polarisation; optical design techniques; optical fabrication; aspect ratio gratings; design; e-beam lithography; fabrication; polarization separation; subwavelength grating; wavelength 633 nm;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Fiber Optics and Photonics (PHOTONICS), 2012 International Conference on
Conference_Location :
Chennai
Print_ISBN :
978-1-4673-4718-1
Type :
conf
Filename :
6545515
Link To Document :
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