• DocumentCode
    610549
  • Title

    Fabrication of high density waveguide structures using e-beam lithography

  • Author

    Kasture, S. ; Nikesh, V.V. ; Mulay, G. ; Venu Gopal, Achanta

  • Author_Institution
    Tata Inst. Fundamental Res., Mumbai, India
  • fYear
    2012
  • fDate
    9-12 Dec. 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Waveguides are an integral part of optical circuits. Fabrication of dense waveguides using electron-beam lithography is critical because of issues like stitching errors and proximity effect. We present a simple method to overcome these issues.
  • Keywords
    electron beam lithography; optical fabrication; optical waveguides; proximity effect (lithography); dense waveguides; e-beam lithography; electron-beam lithography; high density waveguide structures; optical circuits; proximity effect; stitching errors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Fiber Optics and Photonics (PHOTONICS), 2012 International Conference on
  • Conference_Location
    Chennai
  • Print_ISBN
    978-1-4673-4718-1
  • Type

    conf

  • Filename
    6545546
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=610549