DocumentCode :
610549
Title :
Fabrication of high density waveguide structures using e-beam lithography
Author :
Kasture, S. ; Nikesh, V.V. ; Mulay, G. ; Venu Gopal, Achanta
Author_Institution :
Tata Inst. Fundamental Res., Mumbai, India
fYear :
2012
fDate :
9-12 Dec. 2012
Firstpage :
1
Lastpage :
3
Abstract :
Waveguides are an integral part of optical circuits. Fabrication of dense waveguides using electron-beam lithography is critical because of issues like stitching errors and proximity effect. We present a simple method to overcome these issues.
Keywords :
electron beam lithography; optical fabrication; optical waveguides; proximity effect (lithography); dense waveguides; e-beam lithography; electron-beam lithography; high density waveguide structures; optical circuits; proximity effect; stitching errors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Fiber Optics and Photonics (PHOTONICS), 2012 International Conference on
Conference_Location :
Chennai
Print_ISBN :
978-1-4673-4718-1
Type :
conf
Filename :
6545546
Link To Document :
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