Title :
Short channel poly-Ge junction-less p-type FinFETs for BEOL transistors
Author :
Kamimuta, Y. ; Ikeda, Ken-ichi ; Furuse, Kazutaka ; Irisawa, T. ; Tezuka, Taro
Author_Institution :
Green Nanoelectron. Center (GNC), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
Abstract :
Short channel poly-Ge JL FinFETs for BEOL-Trs were demonstrated for the first time. The Ion/Ioff ratio of 104 was obtained by thinning WFin to 10 nm. Ion of the short channel poly-Ge JL FinFETs reached to 1/2~1/3 of those of crystalline Si pFETs. It was shown that reduction of the parasitic resistance and improvement of channel mobility allows further performance enhancements. Poly-Ge JL FinFET is promising for BEOL-Trs in terms of the current drivability, although the cut-off characteristics should be more improved.
Keywords :
MOSFET; electric resistance; elemental semiconductors; germanium; semiconductor junctions; silicon; BEOL transistor; Ge; Si; channel mobility; crystalline pFET; current drivability; cut-off characteristics; parasitic resistance reduction; short channel poly-Ge JL FinFET; short channel poly-Ge junction-less p-type FinFET; Fabrication; FinFETs; Logic gates; Performance evaluation; Silicon; Very large scale integration;
Conference_Titel :
VLSI Technology, Systems, and Applications (VLSI-TSA), 2013 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4673-3081-7
Electronic_ISBN :
978-1-4673-6422-5
DOI :
10.1109/VLSI-TSA.2013.6545620