Title :
Performance Characteristics of UV-C AlGaN-Based Lasers Grown on Sapphire and Bulk AlN Substrates
Author :
Martens, M. ; Mehnke, Frank ; Kuhn, C. ; Reich, Christoph ; Kueller, Viola ; Knauer, A. ; Netzel, Carsten ; Hartmann, C. ; Wollweber, Juergen ; Rass, Jens ; Wernicke, T. ; Bickermann, Matthias ; Weyers, M. ; Kneissl, M.
Author_Institution :
Inst. fur Festkorperphys., Tech. Univ. Berlin, Berlin, Germany
Abstract :
The performance characteristics of optically pumped laser heterostructures emitting in the UV-C spectral range between 272 and 279 nm are investigated. The laser heterostructures were grown by metal-organic vapor phase epitaxy on (0001) planar AlN/sapphire, epitaxially laterally overgrown (ELO) AlN/sapphire, and bulk AlN substrates with threading dislocation densities ranging from 2×1010 to 104 cm-2. We found that the defect density strongly affects the laser performance. The lowest pulse threshold energy density of 50 mJ/cm2 under resonant optical pumping condition was obtained for an AlGaN multiple quantum well laser grown pseudomorphically on low defect density bulk AlN substrate. Lasing was also observed for AlGaN MQW heterostructures grown on ELO AlN/sapphire templates. The laser emission in all lasers was TE polarized. However, no lasing was observed for heterostructures grown on high defect density AlN/sapphire.
Keywords :
III-V semiconductors; alumina; gallium compounds; integrated optics; light polarisation; optical pumping; quantum well lasers; sapphire; substrates; ultraviolet spectra; vapour phase epitaxial growth; Al2O3; AlGaN; AlGaN MQW heterostructure growth; AlN; ELO bulk aluminum nitride-sapphire substrates; TE polarization; epitaxially laterally overgrown; high defect density; laser emission; metal-organic vapor phase epitaxy; multiple quantum well laser; optically pumped laser heterostructures; pulse threshold energy density; resonant optical pumping condition; threading dislocation densities; ultraviolet-C AlGaN-based lasers growth; wavelength 272 nm to 279 nm; Aluminum gallium nitride; III-V semiconductor materials; Laser excitation; Pump lasers; Quantum well devices; Substrates; AlGaN; AlN substrates; epitaxial lateral overgrowth; lasers; polarization; sapphire substrates; ultraviolet;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2013.2293611