Title :
Porous silicon formation on solar cells surface
Author :
Obukhova, Tetyana
Author_Institution :
Microelectron. Dept., NTUU KPI, Kiev, Ukraine
Abstract :
In the paper the process of formation of porous silicon on textured surface of solar cells is studied. It is shown that porous layers formed by the etchant HF:NaNO2:H2O, can be successfully applied in photovoltaic technology as antireflective coating . Technology of the obtaining of porous layer by chemical etching can be applied after contact grid formation. It is shown that as a result of a porous layer efficiency of solar cells increased by 20-30% on average.
Keywords :
elemental semiconductors; etching; hydrogen compounds; porous semiconductors; silicon; sodium compounds; solar cells; HF:NaNO2:H2O; Si; antireflective coating; chemical etching; contact grid formation; etchant; photovoltaic technology; porous layer efficiency; porous silicon formation; solar cells surface; textured surface; Conferences; Etching; Photovoltaic cells; Silicon; Substrates; Surface texture; antireflection coating; chemical etching; porous silicon; solar cell;
Conference_Titel :
Electronics and Nanotechnology (ELNANO), 2013 IEEE XXXIII International Scientific Conference
Conference_Location :
Kiev
Print_ISBN :
978-1-4673-4669-6
DOI :
10.1109/ELNANO.2013.6551993
