DocumentCode
615023
Title
Integrated photodiode characterization in a SiGe BiCMOS process
Author
Sharif-Bakhtiar, Alireza ; Shahramian, Shayan ; Rousson, Alain ; Yasotharan, Hemesh ; Carusone, Tony Chan
Author_Institution
Univ. of Toronto, Toronto, ON, Canada
fYear
2013
fDate
5-8 May 2013
Firstpage
68
Lastpage
69
Abstract
In this paper three photodetector structures were simulated, fabricated and characterized at 850nm in a SiGe BiCMOS process. The measurement and simulation results suggest that the additional vertical layers offered by SiGe process compared to CMOS can facilitate higher detector bandwidth at the expense of reduced low frequency responsivity.
Keywords
BiCMOS integrated circuits; Ge-Si alloys; frequency response; integrated optics; photodetectors; photodiodes; BiCMOS process; SiGe; frequency responsivity; integrated photodiode; photodetectors; Bandwidth; BiCMOS integrated circuits; Detectors; Optical receivers; Photodiodes; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Interconnects Conference, 2013 IEEE
Conference_Location
Santa Fe, NM
Print_ISBN
978-1-4673-5061-7
Electronic_ISBN
978-1-4673-5062-4
Type
conf
DOI
10.1109/OIC.2013.6552927
Filename
6552927
Link To Document