DocumentCode :
61613
Title :
Total Dose Irradiation-Induced Degradation of Hysteresis Effect in Partially Depleted Silicon-on-Insulator NMOSFETs
Author :
Huixiang Huang ; Dawei Bi ; Bingxu Ning ; Yanwei Zhang ; Zhengxuan Zhang ; Shichang Zou
Author_Institution :
State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
Volume :
60
Issue :
2
fYear :
2013
fDate :
Apr-13
Firstpage :
1354
Lastpage :
1360
Abstract :
In this work, we present a study of hysteresis effect degradation induced by total dose irradiation in partially depleted SOI nMOSFETs with floating bodies. In addition to traditional linear kink effect, evidence is provided for a new hysteresis effect which occurs in output characteristics during the forward and reverse sweeps. For the first time, it is shown that at a sufficiently high irradiation level, the hysteresis behaviors both in transfer and output characteristics vanish due to interface traps and oxide trapped charge. 3D process and device simulations are performed to investigate the combined effects of charge trapping in oxide and interface traps.
Keywords :
MOSFET; hysteresis; nuclear electronics; radiation effects; semiconductor device models; silicon-on-insulator; 3D process; Si; charge trapping effects; fĺoating bodies; high irradiation level; hysteresis behaviors; hysteresis effect; linear kink effect; output characteristics; oxide trapped charge; partially depleted silicon-on-insulator NMOSFET; total dose irradiation-induced degradation; transfer characteristics; Charge carrier processes; Hysteresis; Logic gates; MOSFETs; Radiation effects; Transconductance; Tunneling; Hysteresis; linear kink effect; silicon-on-insulator (SOI); total dose irradiation;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2013.2239660
Filename :
6464614
Link To Document :
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