DocumentCode :
61618
Title :
NOT and NOR Logic Circuits Using Passivation Dielectric Involved Dual Gate in a-InGaZnO TFTs
Author :
Seung Hee Nam ; Pyo Jin Jeon ; Young Tack Lee ; Raza, Syed Raza Ali ; Seongil Im
Author_Institution :
R&D Center, LG Display Co., Paju, South Korea
Volume :
34
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
1527
Lastpage :
1529
Abstract :
Dual-gate amorphous (a)-InGaZnO thin-film transistors (TFTs) are simply realized using the passivation layer of already fabricated bottom-gate TFTs as top-gate dielectric, so that an electrical biasing of either top or bottom gate may control the threshold behavior of the device. By applying a voltage to the top gate of a TFT that is serially connected to the next adjacent TFT, we could form a logic inverter with a decent voltage gain and desirable transition voltage, while a NOR logic circuit was also achieved by independent control of the dual gates. On the one hand, when both of the top and bottom gates are simultaneously controlled by single bias, our dual-gate TFT displays an excellent subthreshold swing property that leads to an excellent voltage gain in an inverter.
Keywords :
II-VI semiconductors; amorphous semiconductors; gallium compounds; indium compounds; logic circuits; logic gates; passivation; thin film transistors; wide band gap semiconductors; zinc compounds; InGaZnO; NOR logic circuits; NOT logic circuits; dielectric passivation; dual-gate amorphous thin-film transistors; electrical biasing; fabricated bottom-gate TFT; logic inverter; subthreshold swing property; threshold behavior; transition voltage; voltage gain; Dielectrics; Indium gallium zinc oxide; Inverters; Logic circuits; Passivation; Thin film transistors; Amorphous InGaZnO; dual-gate TFT; logic circuit; thin-film transistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2285185
Filename :
6644271
Link To Document :
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