DocumentCode :
618625
Title :
Characterization of bonding interface prepared by room temperature bonding after flattening by thermal imprint process
Author :
Kurashima, Yuichi ; Maeda, Atsushi ; Takagi, Hiroyuki
Author_Institution :
Res. Center for Ubiquitous MEMS & Micro Eng. (UMEMSME), Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
fYear :
2013
fDate :
16-18 April 2013
Firstpage :
1
Lastpage :
4
Abstract :
We developed the room temperature bonding of Au film flattened by thermal imprint process. The Au film surfaces were flattened by thermal imprint process. As a result, the flattening process was effective in case of the low bonding load or rougher Au surface. And we also apply developed process to bonding of seal ring patterns fabricated by Au electroplating. The surface of Au film could be successfully flattened by the thermal imprint process. As a result, large bonding strength was obtained for seal ring patterns with a width of 100 μm.
Keywords :
bonding processes; electroplating; gold; microfabrication; bonding interface characterization; bonding strength; flattening process; gold electroplating; gold film surface; ring pattern seal; room temperature bonding; size 100 mum; thermal imprint process; Bonding; Films; Gold; Rough surfaces; Silicon; Surface roughness; Surface treatment; room temperature bonding; thermal imprint;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 2013 Symposium on
Conference_Location :
Barcelona
Print_ISBN :
978-1-4673-4477-7
Type :
conf
Filename :
6559410
Link To Document :
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