DocumentCode :
618905
Title :
Optimization of silicon nanowire based field-effect pH sensor with back gate control
Author :
Anran Gao ; Pengfei Dai ; Na Lu ; Tie Li ; Yuelin Wang
Author_Institution :
State Key Labs. of Transducer Technol. & Sci. & Technol. on Micro-Syst. Lab., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
fYear :
2013
fDate :
7-10 April 2013
Firstpage :
116
Lastpage :
119
Abstract :
A field effect transistor (FET) sensor for pH detection was developed based on CMOS-compatible silicon nanowires. Optical lithography and anisotropic self-stop etching were employed to guarantee low cost and batch production for silicon nanowires. The pH nanosensor can detect the change of the hydrogen ion concentration effectively. In addition, it is demonstrated that the back gate electrode can tune the nanowire detection sensitivity, which can be optimized and exponentially enhanced in the subthreshold regime. The development of a nanoscale sensor with physically engineered gates offers the possibility of highly parallel labeling and detection of chemical and biological molecules with selective control of individual array elements in a single integrated chip.
Keywords :
CMOS integrated circuits; chemical sensors; etching; field effect transistors; nanosensors; nanowires; pH measurement; sensitivity; silicon; CMOS-compatible silicon nanowires; FET sensor; Si; anisotropic self-stop etching; back gate control; batch production; biological molecules detection; chemical detection; high parallel labeling; hydrogen ion concentration; individual array elements; nanoscale sensor; nanowire detection sensitivity; optical lithography; optimization; pH detection; pH nanosensor; silicon nanowire based field-effect pH sensor; single integrated chip; Field effect transistors; Logic gates; Nanobioscience; Nanoscale devices; Sensitivity; Sensors; Silicon; FET; hydrogen ion; nanosensor; silicon nanowire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location :
Suzhou
Electronic_ISBN :
978-1-4673-6351-8
Type :
conf
DOI :
10.1109/NEMS.2013.6559694
Filename :
6559694
Link To Document :
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