Title :
Electrical properties of micro-heaters using sputtered NiCr thin film
Author :
Ting-Ting Wu ; Jing-Quan Liu ; Shui-Dong Jiang ; Bin Xu ; Bin Yang ; Hong-Ying Zhu ; Chun-Sheng Yang
Author_Institution :
Sci. & Technol. on Micro/Nano Fabrication Lab., Shanghai, China
Abstract :
NiCr (80/20 at.%) thin films were deposited on SiO2/Si substrates as a cryonetic heater by DC magnetron sputtering technique. After a series of annealing treatments under various conditions, the electrical properties and microstructure of the films were investigated. The crystallinity and composition of the films were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The films are changed from crystalline to amorphous phase after annealing at 250°C in nitrogen ambient and the annealing conditions have a significant effect on the resistivity and temperature coefficient of resistance (TCR) of the films. TCR of the samples annealed at 250°C for 9 minutes in N2 shows 9.23 ppm/K at 20K which is finally confirmed as the optimal result.
Keywords :
X-ray diffraction; annealing; chromium alloys; crystal microstructure; electrical resistivity; metallic thin films; micromechanical devices; nickel alloys; scanning electron microscopy; sputter deposition; thin film devices; DC magnetron sputtering technique; NiCr; SEM; Si; X-ray diffraction; XRD; amorphous phase; annealing; annealing conditions; annealing treatments; crystallinity; electrical properties; microheaters; nitrogen ambient; scanning electron microscopy; sputtered thin film; temperature 20 K; temperature 250 K; temperature coefficient of resistance; time 9 min; Annealing; Films; Heating; Nitrogen; Resistance; Temperature; X-ray scattering; TCR; cryonetic; crystallinity; heater; resistor;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location :
Suzhou
Electronic_ISBN :
978-1-4673-6351-8
DOI :
10.1109/NEMS.2013.6559771
