Title :
Metal-catalyst free integration of SiO2 nanowires into carbon MEMS
Author :
Liangliang Xu ; Tielin Shi ; Shuang Xi ; Hu Long ; Shiyuan Liu ; Zirong Tang
Author_Institution :
State Key Lab. of Digital Manuf. Equip. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
This paper presents an innovative technique of integrating silica nanowires to photoresist-derived carbon microelectromechanical systems (C-MEMS) on silicon substrate. The silica nanowires were synthesized through thermal treatment in a tube furnace at 1200 °C under a gaseous environment of N2 and H2. The stiff morphology and radicalized distribution around carbon posts of nanowires was observed, which was different from much of the previous studies. High-temperature annealing and meticulous-controlled pyrolying atmosphere could be the causes of the formation of unusual SiO2/C-MEMS integrated structures.
Keywords :
annealing; furnaces; micromechanical devices; nanowires; photoresists; silicon compounds; Si; SiO2; carbon MEMS; gaseous environment; high-temperature annealing; metal-catalyst free integration; meticulous-controlled pyrolying atmosphere; photoresist-derived C-MEMS; photoresist-derived carbon microelectromechanical systems; radicalized distribution; silica nanowires; silica-C-MEMS integrated structures; silicon dioxide nanowires; silicon substrate; stiff morphology; temperature 1200 degC; thermal treatment; tube furnace; Carbon; Lithography; Nanowires; Resists; Silicon; Silicon compounds; C-MEMS; metal-catalyst free; silica nanowires;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location :
Suzhou
Electronic_ISBN :
978-1-4673-6351-8
DOI :
10.1109/NEMS.2013.6559833
