Title :
Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography
Author :
Li Wang ; Schift, Helmut ; Kristiansen, Per Magnus ; Jefimovs, Konstantins ; Solak, Harun H. ; Gobrecht, Jens ; Ekinci, Y.
Author_Institution :
Lab. for Microand Nanotechnol., Paul Scherrer Inst., Villigen, Switzerland
Abstract :
We present the design of a bilayer metallic wire-grid polarizer (WGP) optimized for operation in the deep-ultraviolet (DUV) region, and their high-throughput fabrication of over large areas by nanoimprint lithography (NIL). The master imprint stamps were fabricated using our newly developed scanning exposure strategy with extreme ultraviolet interference lithography (EUV-IL). Optical measurements show that the fabricated bi-layer polarizer covers a broad spectral range, starting from wavelength of 280 nm. TM transmission of 50%, and an extinction ratio of 20 dB (102) were realized.
Keywords :
electromagnetic wave interference; nanofabrication; nanolithography; optical variables measurement; soft lithography; DUV region; EUV interference; EUV-IL; IR fabrication; NIL; TM transmission; WGP; bilayer metallic wire-grid polarizer; broad spectral range; deep-ultraviolet region; high-throughput fabrication; master imprint stamps; nanoimprint lithography; optical measurements; scanning exposure strategy; ultraviolet interference lithography; Extinction ratio; Fabrication; Gratings; Lithography; Polymers; Silicon; Ultraviolet sources; EUV; Interference; lithography; nanoimprint; wire-grid polarizer (WGP);
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2013 8th IEEE International Conference on
Conference_Location :
Suzhou
Electronic_ISBN :
978-1-4673-6351-8
DOI :
10.1109/NEMS.2013.6559941
